Photo-curable urethane-acrylate resin composition for permanent resist
US4587201A · kind A · utility
21Cited by
7References
2Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 20, 1985 |
| Grant date | May 6, 1986 |
| Priority date | — |
| Expiry date | May 20, 2005 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K3/0023
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
A photo-curable resin composition which comprises mixing urethane-acrylate resin [I], which is obtained by reacting components A and B, i.e., PA0 Component-A: Polyisocyanates containing polybutadiene with PA0 Component-B: Acrylate or methacrylate having a hydroxyl group in the molecule thereof and PA0 a photopolymerization initiator [II]. The cured composition is suitable as an additive plating resist in the manufacture of electronic circuitry.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.