Cement slurries for deep holes, with a copolymer content for reducing the water loss
US4587283A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Apr 3, 1985 |
| Grant date | May 6, 1986 |
| Priority date | — |
| Expiry date | Apr 3, 2005 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC09K8/46
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
Cement slurries for deep holes, with a content of copolymers which are composed of 5-95% by weight of groups of the formula ##STR1## in which R.sub.1 is hydrogen or methyl, PA0 R.sub.2 is C.sub.2 -C.sub.10 -alkylene and PA0 Me is ammonium, lithium, sodium or potassium, of 5-60% by weight of groups of the formula ##STR2## in which R.sub.3 is hydrogen, --CH.sub.3 or C.sub.2 H.sub.5 and PA0 R.sub.4 is --CH.sub.3 or C.sub.2 H.sub.5, or PA0 R.sub.3 and R.sub.4 together are a propylene group which, with incorporation of the radical ##STR3## forms a pyrrolidone radical, and of 0-90% by weight of groups of the formula ##STR4## in which R.sub.6 is hydrogen or methyl and PA0 R.sub.7 is carboxamido, carboxyl, cyano or carbomethoxy. These copolymers reduce the water loss of cement slurries which are required for deep holes.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.