Process for the photochemical vapor deposition of aromatic polymers
US4588609A · kind A · utility
Inventors
Key dates
| Filing date | Nov 26, 1984 |
| Grant date | May 13, 1986 |
| Priority date | — |
| Expiry date | Nov 26, 2004 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB05D3/06
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A low-temperature process for forming a thin film of an aromatic polymer on the surface of a substrate by exposing the substrate to a monomer precursor containing arylene groups in the presence of radiation of a selected wavelength. Upon radiation inducement, the monomer units interact to form a polymer comprising directly bonded repeating arylene groups, and the polymer deposits as a layer on the substrate. Optionally, the polymer layer may be simultaneously or subsequently doped to provide a conductive polymer layer. Specifically disclosed polymers are polyparaphenylene and its antimony pentafluoride-doped derivative. The former is useful as a dielectric insulator or passivation material in semiconductor devices and circuits, while the latter is useful in batteries and solar cells, or electromagnetic shielding.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.