Water vapor, reaction rate and deposition rate control of tin oxide film by CVD on glass
US4590096A · kind A · utility
22Cited by
2References
10Claims
0Family size
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Key dates
| Filing date | Dec 28, 1984 |
| Grant date | May 20, 1986 |
| Priority date | — |
| Expiry date | Dec 28, 2004 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/407
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A chemical vapor deposition method for forming fluorine-doped tin oxide coatings uses a liquid coating composition which includes an organic fluorine dopant and an organotin compound. In the method, the gas stream contains sufficient water vapor such that its relative humidity at 18.degree. C. is about 6% to 100%. A preferred liquid coating composition is monobutyltin trichloride and trifluoroacetic acid.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.