Positive-working photoresist composition and method for forming a light-absorbing matrix in a color CRT structure
US4590138A · kind A · utility
6Cited by
7References
4Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 1, 1985 |
| Grant date | May 20, 1986 |
| Priority date | — |
| Expiry date | May 1, 2005 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J9/2278
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A positive-working photoresist composition is described comprising a solution of polyvinyl alcohol, an inorganic ferric salt, ammonium trioxalatoferrate and a diol such as 1,4-butanediol. There is also described the addition of a finely divided black pigment to such a composition and the use of such a black pigmented composition for the formation of a light-absorbing matrix in a color CRT screen structure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.