Photopolymerizable recording material and the production of relief plates using this recording material

US4590144A · kind A · utility

Assignee

• BASF SE

Inventors

• Gunnar Schornick · Neuleiningen, DE
• Mong-Jon Jun · Speyer, DE
• Axel Sanner · Bischofswerda, DE
• August Lehner
• Werner Lenz · Bad Dürkheim, DE
• Peter Richter · Karlstein, DE
• Albrecht Eckell · Bischofswerda, DE

Key dates

• Filing date: Jul 13, 1984
• Grant date: May 20, 1986
• Expiry date: Jul 13, 2004

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10S430/107
• WIPO field: Macromolecular chemistry, polymers
• WIPO sector: Chemistry

Abstract

A photopolymerizable recording material for the production of relief plates comprises a photopolymerizable layer which can be developed in an alcoholic solution and contains a mixture of a photoinitiator, a photopolymerizable monomer and a linear, high molecular weight polyurethane which possesses activated double bonds in side branches, and is prepared using a polyether-diol from the group comprising the polyethylene glycols, propylene glycols and ethylene glycol/propylene glycol co-condensates.