Patent · US Expired

Device for projection copying of masks onto a workpiece

US4592648A · kind A · utility

9Cited by

3References

5Claims

0Family size

Assignee

Perkin-Elmer Censor Anstalt · LI

Inventors

Werner Tabarelli · Vaduz, LI
Herbert E. Mayer · Abensberg, DE

Key dates

Filing date	Jan 23, 1985
Grant date	Jun 3, 1986
Priority date	—
Expiry date	Jan 23, 2005

Classification

Technology area (CPC G)Physics
CPC primaryG03F9/70
WIPO fieldOptics
WIPO sectorInstruments

Abstract

For a device for projection copying of masks on a semiconductor substrate for the manufacture of integrated circuits, it is intended that the copying of an adjusting mark of the workpiece onto a sensor takes place by means of the projection lens, whereby the directly reflected beams of the light which makes visible the adjusting mark are masked out by a mirror, and the position-sensitive sensor is fastened at the underside of the frame carrying the mask.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.