Electrophoretic deposition process
US4592816A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Sep 26, 1984 |
| Grant date | Jun 3, 1986 |
| Priority date | — |
| Expiry date | Sep 26, 2004 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/138
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The invention is directed to a photosensitive polymer composition capable of being electrophoretically depositable as an adherent, uniform photosensitive film on a conductive surface. The photosensitive polymer composition useful for electrodeposition is formed from an aqueous solution or emulsion of at least one polymer having charged carrier groups, a photoinitiator and a source of unsaturation for crosslinking the resulting film upon exposure to actinic radiation. The photosensitive film formed from the photosensitive polymer composition is aqueous developable and resistant to strong inorganic acids and strong bases. The photosensitive polymer composition is useful in the preparation of printed circuit boards, lithographic printing plates, cathode ray tubes, as well as in chemical milling, solder resist and planarizing layer applications.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.