Electrically enhanced liquid jet processing
US4599154A · kind A · utility
77Cited by
4References
5Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 15, 1985 |
| Grant date | Jul 8, 1986 |
| Priority date | — |
| Expiry date | Mar 15, 2005 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E10/50
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An electrically enhanced liquid jet process particularly adapted for forming scribe lines on thin film material deposited during fabrication of thin film solar cell devices. A narrow jet of liquid solution is directed onto a thin film along a desired line while an electrical current is passed through the liquid jet and the film being processed. The liquid solution is selected to remove material along the desired line only at its point of contact with the film but to be substantially nonreactive with the film in all other areas where there is an absence of electrical enhancement.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.