X-ray mask with Ni pattern
US4599737A · kind A · utility
3Cited by
2References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 6, 1983 |
| Grant date | Jul 8, 1986 |
| Priority date | — |
| Expiry date | Sep 6, 2003 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/22
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An X-ray mask having a mask pattern formed from nickel or a material having nickel as a principal component supported on a thin membrane. The X-ray mask has characteristics substantially equal to those of the conventional X-ray mask employing Au as a mask pattern and is much lower in price than the Au-containing mask pattern. In addition, since the X-ray mask can easily be formed by electroless plating, it is possible to form a mask pattern with a higher accuracy than that in case of employing Au alone.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.