Patent · US Expired

Device for the formation and deposition on a substrate of monomolecular films

US4599969A · kind A · utility

11Cited by

0References

9Claims

0Family size

Assignee

COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES · FR

Inventors

Andre Barraud · Les Ulis, FR
Jean Lelcuf · Gif-sur-Yvette, FR

Key dates

Filing date	Nov 30, 1984
Grant date	Jul 15, 1986
Priority date	—
Expiry date	Nov 30, 2004

Classification

Technology area (CPC B)Performing Operations; Transporting
CPC primaryB82Y40/00
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

Tank for depositing a monomolecular film. It comprises a tank having walls and a base and containing a liquid, a barrier defining two areas on the surface of the liquid, means for displacing the barrier on the surface of the liquid, at least one substrate and means for displacing the substrate. The level of the liquid is below the horizontal rim of the tank. The barrier has a break at each of its ends and rests on the edges of the tank. The break defines a narrower portion partly submerged in the liquid. Sealing means are provided between the faces of the narrower portion and the facing walls.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.