Magnetron cathode for sputtering ferromagnetic targets
US4601806A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Dec 5, 1984 |
| Grant date | Jul 22, 1986 |
| Priority date | — |
| Expiry date | Dec 5, 2004 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3408
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A magnetron cathode for sputtering targets of ferromagnetic materials. A cathode ground body (2) has at least one supporting surface (4a, 4c) for the target and a magnet system (6) with magnet poles of opposite polarity cohering on the circumference, lying inside one another, and separated by a gap (5a). The target is divided by at least one air gap geometrically similar to the shape of the interval into at least two target parts (12, 13) which are staggered in the direction of the depth of the cathode on the at least one supporting surface (4a, 4c). In accordance with the invention, PA0 (a) the magnet system (6) is disposed in back of the farthest set-back supporting surface (4a) for the target (12, 13), and PA0 (b) The width "s" of the air gap (14) in the direction of the depth of the cathode is smaller than the dark space interval necessary under operating conditions.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.