Reactor for plasma desmear of high aspect ratio hole
US4601807A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jan 17, 1985 |
| Grant date | Jul 22, 1986 |
| Priority date | — |
| Expiry date | Jan 17, 2005 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K2203/095
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A system for generating uniform gas flow in a plasma reactor chamber. A hollow electrode having two major surfaces and a plurality of apertures in both major surfaces is disposed in the chamber. Connected to this hollow electrode is a radio frequency power source for generating an electrical field. A second hollow electrode also having two major surfaces with a plurality of apertures in both surfaces is disposed opposite the first electrode. A second radio frequency power source is connected to the second electrode. A substrate is placed in the chamber between the first and second electrodes. Provision is made for introducing a gas to be converted in a reactive species by the radio frequency electrical field so that gas is uniformly distributed across the substrate. '
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.