Photoresist compositions containing t-substituted organomethyl vinylaryl ether materials
US4603101A · kind A · utility
94Cited by
1References
5Claims
0Family size
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Key dates
| Filing date | Sep 27, 1985 |
| Grant date | Jul 29, 1986 |
| Priority date | — |
| Expiry date | Sep 27, 2005 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/038
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
t-Butylvinylaryl ethers are provided which can be used to make t-butyl substituted polyaryl ethers and photoresist compositions. The photoresist compositions can be made by combining the t-butylpolyaryl ethers with aromatic onium salts.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.