MBE system with in-situ mounting
US4605469A · kind A · utility
19Cited by
4References
24Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 10, 1983 |
| Grant date | Aug 12, 1986 |
| Priority date | — |
| Expiry date | Nov 10, 2003 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S414/139
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A molecular beam epitaxy system wherein the molybdenum substrate holder and the molybdenum ring which assembles to the substrate holder to hold the wafer are kept in vacuum essentially all the time. Wafers are not pre-mounted to substrate holders, but the wafer mounting step is performed in ultrahigh vacuum after a cassette of wafers has already been loaded and outgassed, under ultrahigh vacuum. Thus, the substrate holder can be outgassed separately at high temperatures, and can remain under high vacuum.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.