Method of reducing treatment of silver halide photographic light-sensitive material for photochemical process
US4606996A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 3, 1985 |
| Grant date | Aug 19, 1986 |
| Priority date | — |
| Expiry date | Dec 3, 2005 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/162
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A silver halide photographic light-sensitive material for photomechanical process is described, comprising a support, at least one photosensitive silver halide emulsion layer thereon, and at least one light-insensitive upper layer on the emulsion layer. At least one of the light-insensitive upper layers contains a compound having an electric charge and being substantially insoluble in water but soluble in a water-miscible organic solvent; a method for a reducing treatment is also described, which comprises bringing a silver image formed on the light-sensitive material into contact with a reducer through the light-insensitive upper layer containing the aforesaid compound.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.