High intensity microfocus X-ray source for industrial computerized tomography and digital fluoroscopy
US4607380A · kind A · utility
130Cited by
2References
15Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jun 25, 1984 |
| Grant date | Aug 19, 1986 |
| Priority date | — |
| Expiry date | Jun 25, 2004 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J35/10
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A high intensity microfocus x-ray source for the inspection of superalloy objects and the like operates at a voltage of the order of 400-500 kV with an electron beam focal spot size of the order of 2-10 mils and at power levels of tens to hundreds of kilowatts and affords a brightness improvement of at least three thousand over conventional x-ray sources.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.