Self purging processing liquid applicator
US4607929A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Nov 28, 1984 |
| Grant date | Aug 26, 1986 |
| Priority date | — |
| Expiry date | Nov 28, 2004 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03D9/00
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photographic processing liquid applicator having a reservoir for containing a supply of alkaline processing liquid. The upper portion of the reservoir has an egress while a lower portion of the reservoir is provided with an ingress which is in communication with a container of processing liquid. Rotatably mounted within the reservoir is a roller for applying a coating of the processing liquid to a length of sheet material. During each coating operation, a supply of processing liquid greater than that required to coat the sheet material is added to the liquid already in the reservoir, via the ingress, thus causing its level to rise above the egress. Processing liquid is thus skimmed or drained from the surface of the liquid, which liquid would have been most exposed to the adverse affects of the oxygen in the atmosphere.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.