Method and apparatus for repairing defects on a photo-mask pattern
US4609566A · kind A · utility
36Cited by
4References
25Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 20, 1985 |
| Grant date | Sep 2, 1986 |
| Priority date | — |
| Expiry date | Mar 20, 2005 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/146
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photo-mask is mounted on a repairing chamber, with its mask pattern forming surface being exposed to the interior of the chamber. Vaporized repairing material which includes a metallic element is introduced into the chamber, and a laser beam is projected from the exterior of the chamber onto a transparent defect of the mask pattern. The irradiated portion is heated and the vaporized repairing material at the heated portion is resolved, resulting in the metal resolved from the repairing material deposits and fills the transparent defect. Thus, transparent defects of a mask pattern can be repaired in a simplified process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.