Method for forming polymer films having bubble release surfaces
US4610762A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | May 31, 1985 |
| Grant date | Sep 9, 1986 |
| Priority date | — |
| Expiry date | May 31, 2005 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E60/50
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
The invention is a method for forming polymer films having a roughened surface using removable substrates comprising: PA0 (a) providing a removable substrate with a roughened surface; PA0 (b) forming a dispersion of a perfluorinated polymer containing sites convertible to ion exchange groups in a dispersant having: a boiling point less than about 110.degree. C.; a density of from about 1.55 to about 2.2; and a solubility parameter of from greater than about 7.1 to about 8.2 hildebrands; PA0 (c) depositing the dispersion onto the roughened, removable substrate; PA0 (d) removing the dispersant from the dispersion; and PA0 (e) removing the substrate. Particularly preferred as a dispersant is a compound represented by the general formula: EQU XCF.sub.2 --CYZX' wherein: PA0 X is selected from the group consisting of F, Cl, Br, and I; PA0 X' is selected from the group consisting of Cl, Br, and I; PA0 Y and Z are independently selected from the group consisting of H, F, Cl, Br, I and R'; PA0 R' is selected from the group of perfluoroalkyl radicals and chloroperfluoroalkyl radicals having from 1 to 6 carbon atoms. The most preferred dispersant is 1,2-dibromotetrafluoroethane.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.