Electrode for plasma etching system
US4612077A · kind A · utility
119Cited by
3References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 29, 1985 |
| Grant date | Sep 16, 1986 |
| Priority date | — |
| Expiry date | Jul 29, 2005 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3244
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An electrode includes a plurality of nested concentric rings forming plenum chambers. Process gas is fed into the plenum chambers through capillary tubes. The gas is then delivered through slits between the rings into a plasma etching reactor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.