Method for the fabrication of an implantable electrode
US4612100A · kind A · utility
19Cited by
3References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 13, 1984 |
| Grant date | Sep 16, 1986 |
| Priority date | — |
| Expiry date | Dec 13, 2004 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA61N1/05
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
In a method for manufacturing an implantable electrode, particularly a stimulating electrode, vitreous carbon is sputtered from a vitreous carbon target on at least a part of the surface of the electrode. The sputtering is performed in an argon atmosphere at a pressure of 4 to 8.times.10.sup.-2 mbar and at a voltage of 1.6 to 2.4 kV. The electrode may consist essentially of platinum-iridium, vitreous carbon or platinum.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.