Electron beam/optical hybrid lithographic resist process in acoustic wave devices
US4612274A · kind A · utility
6Cited by
0References
5Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 18, 1985 |
| Grant date | Sep 16, 1986 |
| Priority date | — |
| Expiry date | Nov 18, 2005 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/143
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method is disclosed for using a combination of electron beam and photo lithography in making a acoustic wave device. The process is preformed by first using a positive photoresist and electron beam writing to designate the fine lines required in acoustic wave devices. Next, a second photoresist and optical lithography are used to delineate the pad areas.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.