Materials which exhibit a surface active effect with vacuum baked photoresists and method of using the same
US4613404A · kind A · utility
8Cited by
3References
9Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Nov 16, 1984 |
| Grant date | Sep 23, 1986 |
| Priority date | — |
| Expiry date | Nov 16, 2004 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01F41/34
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A process for manufacturing a thin film magnetic head, the improvement wherein a metal, alloy or mixture thereof which improves the surface characteristics of a vacuum baked photoresist is deposited on the vacuum baked photoresist to thereby improve adhesion of a subsequently deposited layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.