Process for the disproportionation of chlorosilanes
US4613489A · kind A · utility
3Cited by
6References
3Claims
0Family size
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Key dates
| Filing date | Sep 10, 1985 |
| Grant date | Sep 23, 1986 |
| Priority date | — |
| Expiry date | Sep 10, 2005 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC01B33/10773
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
The process of disproportionation of chlorosilanes in the presence of a dried catalyst which is dried by heating up to 200.degree. C. under vacuum starting from a water-containing anion exchange cross-linked resin matrix containing as a functional group and said resin matrix stable at temperatures up to about 200.degree. C. without separation of the functional group from the resin matrix to produce the disproportionated product of high purity, semiconductor grade, without any contamination from the catalyst.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.