Charged particle deflection
US4614872A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | May 1, 1984 |
| Grant date | Sep 30, 1986 |
| Priority date | — |
| Expiry date | May 1, 2004 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/1472
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An electron beam or similar charged particles may be deflected by passing through an electrostatic field produced in a deflecting structure. The degree of deflection is controlled by rotating the deflecting structure and path relative to one another. The beam may be rotated relative to the structure by a magnetic beam deflector which compensates for a range of electron energies within the beam so that all electrons are deflected in the electrostatic field by an equal amount.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.