Plasma CVD apparatus for making photoreceptor drum
US4615299A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 7, 1985 |
| Grant date | Oct 7, 1986 |
| Priority date | — |
| Expiry date | Mar 7, 2005 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/3321
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma CVD (chemical vapor deposition) apparatus of the capacitance coupling type for effecting the chemical vapor deposition on a drum which includes an air tight chamber made of an electrically conductive material, a support provided in the chamber for supporting the drum inside the chamber in an electrically insulated relationship with the chamber, and an RF power source for supplying RF power to the drum. The chamber is grounded and, therefore, the plasma is generated between the drum and inside wall of the chamber. The apparatus is provided with means for providing a smooth surface on the drum. The drum can be used as a photoreceptor for use in an electrophotographic copying machine.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.