Inversely processed resistance heater
US4616408A · kind A · utility
32Cited by
5References
10Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jan 4, 1985 |
| Grant date | Oct 14, 1986 |
| Priority date | — |
| Expiry date | Jan 4, 2005 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/49155
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
A unique inverse processed film resistance heater structure is disclosed. A conventional passivation wear layer is deposited directly on a first substrate, followed by the deposition and patterning of resistive and conductive layers, and covered by an isolation layer and a thick support layer. The thick support layer is then bonded to a second substrate and the first substrate is removed so that a uniform, flat passivation layer is exposed. The result is a film resistor which has a reduced failure rate as compared to the prior art because it is covered by a passivation wear layer with fewer pin-holes and reduced stress.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.