Process for removing organic material in a patterned manner from an organic film
US4617085A · kind A · utility
42Cited by
3References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 3, 1985 |
| Grant date | Oct 14, 1986 |
| Priority date | — |
| Expiry date | Sep 3, 2005 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/31127
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method is provided for removing organic material from an organic film in a patterned manner using ultraviolet light at sufficient power density to effect the patterned ablative photodecomposition of an organic film in the form of a blend of aliphatic and aromatic organic material or a copolymer of chemically combined aliphatic units and aromatic units.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.