Light-sensitive diazo composition with acidic compounds for use with lithographic printing plates
US4617250A · kind A · utility
8Cited by
11References
4Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 1, 1984 |
| Grant date | Oct 14, 1986 |
| Priority date | — |
| Expiry date | Jun 1, 2004 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0166
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A light-sensitive composition for use with lithographic printing plates is described which comprises (1) a light-sensitive, organic solvent soluble and substantially water-insoluble diazo resin which is the reaction product of a water-soluble, light-sensitive condensate of an aromatic diazonium compound and an organic condensing agent with a halogenated Lewis acid or a salt thereof, (2) a substantially water-insoluble, film forming organic high-molecular weight compound having an acid value of from 10 to 200, (3) a polynuclear aromatic sulfonic acid or a salt thereof, and (4) a salt-forming organic dye compound.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.