Magnetic thin film
US4618542A · kind A · utility
12Cited by
2References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 21, 1984 |
| Grant date | Oct 21, 1986 |
| Priority date | — |
| Expiry date | Nov 21, 2004 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S428/90
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A magnetic thin film comprised of at least one, usually two magnetic metals selected from iron, nickel, and cobalt is vapor phase grown on a substrate, for example, polyimide film by introducing chemical compounds of the metals in vapor form, a reducing gas, and optionally, an oxidizing gas, into a vacuum chamber where the substrate is placed and preferably heated to a temperature of at least 100.degree. C., and subjecting the reaction gases to plasma excitation, thereby achieving the vapor phase growth of the magnetic thin film on the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.