X-ray lithography system
US4618971A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Sep 13, 1984 |
| Grant date | Oct 21, 1986 |
| Priority date | — |
| Expiry date | Sep 13, 2004 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/04
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
A system is provided for producing plasma pinch X-rays usable in X-ray lithography. Ionized heated plasma is repeatably generated in a first area directly from solid material without exploding the latter. X-rays are generated in a second area by passing high current through the plasma causing radial inward magnetic field pinching. Accurate control and improved intensity performance, and greater flexibility in selection of X-ray emitting materials, are provided by the separation of the plasma generating and the X-ray pinch generating functions. Common electrode structure is provided for plasma generating and for plasma pinching, which common electrode also provides a cylindrical plasma communication passage from the first to the second area, and provides an X-ray emission passage of desired axial orientation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.