Multiple quantum-well infrared detector
US4620214A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 2, 1983 |
| Grant date | Oct 28, 1986 |
| Priority date | — |
| Expiry date | Dec 2, 2003 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10F77/146
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
Alternating layers of N+ GaAs (80 .ANG.) and N+ Ga.sub.1-x Al.sub.x As (300 .ANG.), all heavily doped with a uniform flux of Sn, and biased by 2V, provide a multiple quantum-well heterojunction structure for infrared detection with cutoff wavelength established by the choice of the value x which defines the depth of the wells. Fine tuning of the cutoff wavelength may be achieved by varying the bias voltage. By biasing the individual quantum-well layers progressively through a voltage divider, an avalanche mechanism may be achieved in the detector for signal amplification. The detectors may be fabricated in large two-dimensional arrays.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.