Sputtered indium oxide films
US4622120A · kind A · utility
29Cited by
17References
20Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jan 31, 1984 |
| Grant date | Nov 11, 1986 |
| Priority date | — |
| Expiry date | Jan 31, 2004 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/12681
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method for improving the adhesion of metal to metal oxide films is disclosed, along with improved coated articles produced thereby. The method comprises depositing between a metal and a metal oxide layer a metal containing layer having affinity for both the metal and metal oxide layers . . .
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.