Laser/plasma chemical processing of substrates
US4624736A · kind A · utility
99Cited by
5References
27Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 24, 1984 |
| Grant date | Nov 25, 1986 |
| Priority date | — |
| Expiry date | Jul 24, 2004 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/31116
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A process for the modification of substrate surfaces is described, wherein etching or deposition at a surface occurs only in the presence of both reactive species and a directed beam of coherent light.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.