Process for forming a synthetic resin film on a substrate and apparatus therefor
US4624867A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 21, 1985 |
| Grant date | Nov 25, 1986 |
| Priority date | — |
| Expiry date | Mar 21, 2005 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/02271
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A process for forming a covering film of a synthetic resin on a substrate comprising, under vacuum conditions, evaporating at least two monomers to cause vapors of said at least two monomers to adhere to the substrate, and polymerizing said at least two monomers on said substrate. An apparatus for carrying out the process includes a vacuum chamber and provided therein, means for holding and evaporating at least two raw material monomers for the synthetic resin, means for holding and heating the substrate and a shutter for separating the means for holding the monomers and the means for holding the substrate. The means for holding and heating the monomers can be provided outside the vacuum chamber and a window can be provided in a wall of the chamber to allow the substrate to be irradiated from a light source located outside the chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.