Patent · US Expired

Method and system for a vacuum evaporative deposition process

US4627989A · kind A · utility

41Cited by

8References

5Claims

0Family size

Assignee

Leybold-Heraeus GmbH · DE

Inventors

Albert Feuerstein · Neuberg, DE
Gernot Thorn · Hanau, DE
Horst Ranke · Alzenau, DE

Key dates

Filing date	Aug 8, 1984
Grant date	Dec 9, 1986
Priority date	—
Expiry date	Aug 8, 2004

Classification

Technology area (CPC H)Electricity
CPC primaryH01J37/302
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

A method and system for a vacuum-evaporative film-deposition process displays bar charts of the local evaporation power of each vapor source in the process and the film thickness deposited thereby in spatial coordination on a single display screen.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.