Apparatus for uniform chemical vapor deposition
US4632058A · kind A · utility
20Cited by
3References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 27, 1984 |
| Grant date | Dec 30, 1986 |
| Priority date | — |
| Expiry date | Feb 27, 2004 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/46
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A vertical reactor for chemical vapor deposition having an H.sub.1 /D.sub.1 ratio in the range of 1.10 to 1.40, where H.sub.1 is the height of the reactor bell jar enclosure above the susceptor and D.sub.1 is the diameter of the susceptor. Reactor performance is further improved by extending the outermost coil of the induction coil heating the susceptor beyond the outer diameter of the susceptor and by extending the innermost coil of the induction coil within the inner diameter of the susceptor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.