Patent · US Expired

Method for interconnecting the active zones and/or the gates of a C/MOS integrated circuit

US4632725A · kind A · utility

8Cited by
5References
16Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 15, 1985
Grant dateDec 30, 1986
Priority date
Expiry dateMar 15, 2005

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/76885
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A method for interconnecting the active zones and/or the gates of a C/MOS integrated circuit characterized in that, after producing the constituent elements of the integrated circuit with the exception of the connections, on the complete circuit is directly deposited a coating of a conductive material, which is then etched in order to form the desired connection.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.