Patent · US Expired

Photopolymerizable recording material suitable for the production of photoresist layers

US4632897A · kind A · utility

17Cited by

4References

10Claims

0Family size

Assignee

BASF SE

Inventors

Helmut Barzynski · Bad Dürkheim, DE
Albrecht Eckell · Bischofswerda, DE
Albert Elzer · Otterstadt, DE
Uwe Klinsmann · Mannheim, DE
Reinhold J. Leyrer · Schifferstadt, DE
Axel Sanner · Bischofswerda, DE

Key dates

Filing date	Dec 27, 1983
Grant date	Dec 30, 1986
Priority date	—
Expiry date	Dec 27, 2003

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10S430/111
WIPO fieldAudio-visual technology
WIPO sectorElectrical engineering

Abstract

Photopolymerizable recording materials which are suitable for the production of photoresist layers, and contain one or more thermoplastic vinyl polymers as the binder, one or more low molecular weight, ethylenically unsaturated, photopolymerizable compounds and one or more photoinitiators, with or without other, conventional additives and/or assistants, have excellent adhesion to metallic substrate surfaces if the binder employed is a vinyl polymer which possesses amino and/or imino groups.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.