Polymeric thin film, process for producing the same and products containing said thin film
US4636435A · kind A · utility
Assignees
Inventors
Key dates
| Filing date | Sep 28, 1984 |
| Grant date | Jan 13, 1987 |
| Priority date | — |
| Expiry date | Sep 28, 2004 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31699
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
The present invention concerns a process for producing a novel polymeric thin film having high density, high hardness and high toughness on the surface of a substrate by plasma polymerization. This process comprises providing a gas containing at least one compound selected from halogenated alkanes, alkanes, hydrogen and halogens in specific combinations for plasma polymerization, the atomic ratio of halogen/hydrogen in the aforesaid gas being 0.1 to 5 and the electron temperature of the plasma in the reaction zone being 6,000.degree. K. or higher and lower than 30,000.degree. K. The polymeric thin film obtained is useful on various articles for the purpose of protection, surface hardening, rust proofing, scratch proofing, providing gas barrier, etc. In particular, it is suitable as the protective film of magnetic recording media.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.