Method and apparatus for increasing the durability and yield of thin film photovoltaic devices
US4640002A · kind A · utility
75Cited by
8References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 5, 1985 |
| Grant date | Feb 3, 1987 |
| Priority date | — |
| Expiry date | Dec 5, 2005 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S438/94
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Thin film photovoltaic cells having a pair of semiconductor layers between an opaque and a transparent electrical contact are manufactured in a method which includes the step of scanning one of the semiconductor layers to determine the location of any possible shorting defect. Upon the detection of such defect, the defect is eliminated to increase the durability and yield of the photovoltaic device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.