Method for producing magnetic medium
US4640755A · kind A · utility
8Cited by
2References
7Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Dec 6, 1984 |
| Grant date | Feb 3, 1987 |
| Priority date | — |
| Expiry date | Dec 6, 2004 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11B11/10591
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A method for producing a magnetic medium which includes the steps of sputtering a magnetic material containing iron onto a substrate in an atmosphere of argon gas mixed with nitrogen gas and depositing a magnetic film on the substrate. The nitrogen is preferably present in an amount of 10 to 10000 ppm and serves to increase the saturation intensity of magnetization. The preferred version of the method consists in jointly sputtering a rare earth metal and an iron-cobalt.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.