Photosensitive compounds and lithographic composition or plate therewith having o-quinone diazide sulfonyl ester group
US4640884A · kind A · utility
1Cited by
11References
9Claims
0Family size
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Key dates
| Filing date | Mar 29, 1985 |
| Grant date | Feb 3, 1987 |
| Priority date | — |
| Expiry date | Mar 29, 2005 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/022
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Quinone diazide derivatives of adamantane, and especially quinone diazide derivatives of 1,3-dialkyl-5,7-bis(hydroyphenol) adamantanes, have been found to provide unique properties when coated on metal substrate in the preparation of both positive and negative working lithographic plates. The improved lithographic plates are characterized by enhanced speed, coating oleophilicity, alkali resistance, developer latitude and development speed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.