Aberration measuring method
US4641962A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | May 19, 1983 |
| Grant date | Feb 10, 1987 |
| Priority date | — |
| Expiry date | May 19, 2003 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01M11/0264
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
In aberration measurement, a light beam from a light source provided at the image plane position of a lens to be examined is caused to enter the lens to be examined, the light beam passed through the lens to be examined, is separated into a plurality of light rays in a plane perpendicular to a principal ray or in a plane perpendicular to the optical axis of the lens to be examined, and the position of each light beam is detected at a position which is spaced apart from a position optically conjugate with said image plane position with respect to the lens to be examined and at which the plurality of light rays can be separated from one another.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.