Rotating X-ray mask with sector slits
US4646339A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Jun 11, 1985 |
| Grant date | Feb 24, 1987 |
| Priority date | — |
| Expiry date | Jun 11, 2005 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG21K1/043
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
In an X-ray system with a rotating disk having sector slits transmitting fan shaped X-ray beams from a source through a subject to the image area of an X-ray receptor an improved ratio S/P of X-rays (S) scattered from the subject to primary rays (P) forming a true image of the subject at the image area is realized if the dimensions of the system fall within the following ranges of dimensionless ratios: PA0 (1) DW/RL is less than 0.5; PA0 (2) D/L is greater than 0.15; PA0 (3) LS*N/WD is greater than 0.15 and less than 0.6 wherein PA1 D is the distance of the disk from the X-ray source, PA1 W is the width of the X-ray image area spanned by the narrow beams, PA1 R is the radius of the disk, PA1 L is the distance between the X-ray source and the receptor. PA1 S* is the radially outermost slit width in the X-ray beam, and PA1 N is the number of slits whose beams simultaneously intersect the outer edge of the image area.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.