Production of resist images, and a suitable dry film resist

US4649100A · kind A · utility

Assignee

• BASF SE

Inventors

• Reinhold J. Leyrer · Schifferstadt, DE
• Gerhard Wegner · Mainz, DE
• Michael Mueller · Dresden, DE

Key dates

• Filing date: Nov 27, 1984
• Grant date: Mar 10, 1987
• Expiry date: Nov 27, 2004

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10S438/949
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

In the production of resist images by application of a radiation-sensitive positive-working resist layer based on degradable polymers onto a substrate, imagewise exposure of the resist layer to actinic radiation and removal of the irradiated parts of the layer with development of the resist image, the radiation-sensitive resist layer used is composed of poly(diacetylenes), in particular soluble ones. Preferably, the radiation-sensitive resist layer based on the poly(diacetylenes) contains sensitizers which can be activated by actinic radiation and which, after being activated, induce or accelerate molecular degradation of the poly(diacetylenes). Dry film resists comprise a temporary dimensionally stable base and a radiation-sensitive resist layer which is applied on the base, can be degraded by exposure to actinic radiation and is based on poly(diacetylenes), in particular soluble ones, with or without a cover sheet on top of the said resist layer.