Gas distribution ring for plasma gun
US4649257A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | May 6, 1986 |
| Grant date | Mar 10, 1987 |
| Priority date | — |
| Expiry date | May 6, 2006 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/3484
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A gas distribution ring for a plasma gun comprises a ring member with two sets of gas inlet orifices extending from the outer surface inwardly through the ring member. The outer surface has an undulated groove for an O-ring formed therein, and the orifices are positioned with respect to the undulated O-ring such that one set of orifices are isolated on one side of the O-ring and the other set of orifices are isolated on the other side of the O-ring. In a preferred embodiment the orifices of one set are radial with respect to the axis of the ring, and the orifices on the other side of the undulated O-ring have a tangential component to provide vortical gas flow in the arc region of the gun. The gas distribution ring positioned in the plasma spray gun permits a simple choice between radial and vortical flow in the arc region of the gun, without alteration of the gun.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.