Pulsed gas supply
US4649955A · kind A · utility
12Cited by
3References
1Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 21, 1985 |
| Grant date | Mar 17, 1987 |
| Priority date | — |
| Expiry date | Oct 21, 2005 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T137/86751
- WIPO fieldMechanical elements
- WIPO sectorMechanical engineering
Abstract
The pulsed gas supply consists of a cylindrical gas reservoir which conta a multiplicity of small release ports in a helical pattern and an inner cylindrical rotary valve which also contains a multiplicity of small release ports in the same helical pattern. The reservoir and valve constitute an integral unit which has the advantage of totally balanced forces on a single moving part. This allows for motion free of friction caused by the high pressures of the gas supply.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.