Method and apparatus for operating a CO.sub.2 gas laser
US4651324A · kind A · utility
Inventors
Key dates
| Filing date | Dec 7, 1982 |
| Grant date | Mar 17, 1987 |
| Priority date | — |
| Expiry date | Dec 7, 2002 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S3/09713
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
In electrically pumped CO.sub.2 gas lasers, there take place widely different chemical and physical processes which lead, at least partially, to undesirable interactions of the gases among themselves, and/or of the gases with the electrical and/or the optical field and/or with the materials used in the gas-filled chambers. Bodies that are equipped with surface area-enlarging structures are included in the discharge or resonator chamber or in adjacent secondary chambers. The secondary chambers by themselves act as reservoirs or as carriers of reservoirs for suitable catalysts and gas components and/or the heating of the catalysts, and have a predetermined influence over the conditions of volume and/or pressure and/or temperature. The inclusion of such secondary chambers and such structures which enlarge surface area inside the chambers make possible the attainment of at least an approximate state of equilibrium, which leads to uniformly good discharge and long life with high laser efficiency.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.